Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)
- Author
- Maurice H. Francombe, John L. Vossen
- Language
- English
- Year
- 1997
- Page
- 311
- ISBN
- 0125330235,9780125330237,9780080542904
- File Type
- pdf
- File Size
- 15.0 MiB
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