Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology
- Author
- Christopher L. Borst, William N. Gill, Ronald J. Gutmann (auth.)
- Publisher
- Springer US
- Language
- English
- Edition
- 1
- Year
- 2002
- Page
- 229
- ISBN
- 978-1-4020-7193-5,978-1-4615-1165-6
- File Type
- pdf
- File Size
- 8.3 MiB
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