Photopolymers: Photoresist Materials, Processes, and Applications
- Author
- Kenichiro Nakamura, (Chemical engineer)
- Publisher
- CRC Press/Taylor and Francis Group
- Language
- English
- Year
- 2014
- Page
- x, 188 pages: illustrations
- ISBN
- 978-1-4665-1731-8,146651731X,978-1-4665-1728-8
- File Type
- pdf
- File Size
- 9.3 MiB
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