Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
- Author
- Guilei Wang
- Publisher
- Springer Singapore
- Language
- English
- Edition
- 1st ed. 2019
- Year
- 2019
- Page
- XVI, 115
- ISBN
- 978-981-15-0045-9,978-981-15-0046-6
- File Type
- pdf
- File Size
- 6.4 MiB
How to Download?!!!
Just click on START button on Telegram Bot