- Author
- Yoo, Cha YoungSeong Hwang, Cheol
- Publisher
- Springer
- Language
- English
- Year
- 2014
- Page
- x, 263 pages) : illustrations (some color
- ISBN
- 9781461480532,9781461480549,1461480531,146148054X
- File Type
- File Size
- 8.3 MiB
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
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